AMFeR Chemical Vapor Deposition Laboratory

SEM Microstructure of 3 micron Thick BaM Film

Chemical Vapor Deposition Laboratory
Millimeter-Wave and Microwave Laboratory
MRC Institute workstation and PC cluster facility
Magnetron Sputtering Laboratory

The high temperature chemical vapor deposition system
for growing BaFe films. The system also has capabilities for
plasma enhanced chemical vapor deposition. The system was
custom built in the Physics Department.

An image of the pulsed lase deposition system used
to grow BaFe films. The system consists of a 248 nm
wavelength KrF excimer laser, an ultrahigh vacuum
chamber with a base pressure of 4x10^-10 torr. The
system is being reconfigured to deposit BaFe films in
with oxygen background pressure in the 10^-3 range,
a new high temperature heater capable of reaching
temperatures of 1000 C, and a pulsed magnetic field
oriented perpendicular to the sample normal. The
reconfigured system should be operational by
May 2004.

Another view of the apparatus.