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Advanced Microwave Ferrite Research (AMFeR)

     Status:
Current Research Project

Research Category:
Other

Research Center:
Microelectronics Research and Communications Institute

Sponsor(s)
Office of Naval Research (ONR)

Primary Researchers:
Jeffrey L. Young, David N. McIlroy and Wei Jiang Yeh.

Research Associate:
Carla Blengeri-Oyarce.

Undergraduate Student Research Assistant:
Kevin Ramus.

Duration:
January 1, 2004 to June 30, 2009

Project Web Site




A multidisciplinary team of faculty researchers is currently conducting research on the growth of thick, low loss, self-biased hexa-ferrite films on a silicon substrate for wideband circulator devices. Several sputtering and deposition methods will be explored for thick-film fabrication. These methods include chemical vapor deposition (CVD), plasma enhanced CVD (PECVD), magnetron sputtering, and liquid phase epitaxy deposition techniques. The characteristics of c-axis hexa-ferrite, self-baised films, as required for proper circulator operation in the millimeter bands, have been specified as follows: thickness on the order of 20-50 microns, an internal effective field on the order of 17,000 Oe, a magnetic saturation on the order of 5,000 G, a coercive field on the order of 3,000 Oe, an FMR line-width on the order of 300 Oe at 35 GHz and a loss tangent on the order of 0.005. Such films will be characterized in terms of their micro and macro magnetic properties using experimental techniques. Data obtained from micro-magnetic simulations will be compared with experimental data to validate the predictive capabilities of the analytical and numerical microwave properties. Acceptable microwave properties include a return loss of 15 dB, an isolation of 15 dB and an insertion loss of 3 dB.